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Substrate Heater – 2.0″ Wafer Stage – High Temperature Resistive

MeiVac substrate heaters were designed to operate under rigorous conditions and they are both UHV and O2 compatible. Known for their unprecedented temperature uniformity, the HTR heaters have been used for some very demanding applications. They have been used in sputtering, laser ablation, ion beam deposition, ECR, MOCVD among others. In 2012 MeiVac developed the VTAC – Variable Temperature AC controller to provide a closed loop control package for the HTR heater stages.

HTR Substrate Heater – 2.0″ Wafer Stage – 950˚C
Part Number Description
P/N: SU-200-IH         2.0″ Wafer Stage Substrate Heater
heater_2_inch - SU-200-IH

HTR Substrate Heater -front view

HTR Substrate Heater - side view

2.0″ Wafer Stage Heater – Product & Dimensional Specifications
Wafer Size Maximum Temperature T/C Position DC/RF Bias Oxygen Compatible UHV Compatible
2.0″ (50.8mm) 950˚C One Yes Yes Yes
Dimension A B C D E
      Inches             Ø 3.00                 3.48                 2.37                 2.62                 1.38

Operating Specifications (example at 1 atm pressure)
Parameter Specification
                         Temperature Uniformity         +/- 1%
                         Temperature Repeatability         12˚C
                         Ramp Time to 600˚C         4 min.
                         Ramp Time to 950˚C         12 min.
                         Cool-down Time to Room Temp         35 min.
                         Max Current         10 A
                         Max Voltage         45V
                         Heater Resistance (typical)         5 ohms
                         Power Supply         AC/DC

HTR Optional Accessories
Part Number Description
            P/N: SU-A750         VTAC Controller
            P/N: SU-1018-K-2         Hook-up kit

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