Substrate Heater – 3.0″ Sample Stage – High Temperature Resistive

MeiVac substrate heaters were designed to operate under rigorous conditions and they are both UHV and O2 compatible. Known for their unprecedented temperature uniformity, the HTR heaters have been used for some very demanding applications. They have been used in sputtering, laser ablation, ion beam deposition, ECR, MOCVD among others. In 2012 MeiVac developed the VTAC – Variable Temperature AC controller to provide a closed loop control package for the HTR heater stages.

HTR Substrate Heater – 3.0″ Sample Stage – 950˚C
Part Number Description
  P/N: SU-300-HH        3.0″ Sample Stage Substrate Heater


SU-300-HH substrate heater
SU-300-HH Sample Heater

HTR Substrate Heater -front view

HTR Substrate Heater - side view


3.0″ Sample Stage Heater – Product & Dimensional Specifications
Wafer Size Maximum Temperature T/C Position DC/RF Bias Oxygen Compatible UHV Compatible
2.25″ (57.15mm) 950˚C One Yes Yes Yes
Dimension A B C D E
Inches                Ø 3.50                3.83                2.37               2.62                1.38


Operating Specifications (example at 1 atm pressure)
Parameter Specification
       Temperature Uniformity     +/- 1%
       Temperature Repeatability     12˚C
       Ramp Time to 600˚C     5 min.
       Ramp Time to 950˚C     13 min.
       Cool-down Time to Room Temp     40 min.
       Max Current     9 A
       Max Voltage     85V
       Heater Resistance (typical)     10 ohms
       Power Supply     AC/DC


HTR Optional Accessories
Part Number Description
       P/N: SU-A750     VTAC Controller
       P/N: SU-1018-K-2     Hook-up kit


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