MAK Sputter Source - Benefits
Designed to present the smallest profile possible, with higher rates than any comparable sputter sources available, unique planar magnetron MAK sputter guns have been used by MeiVac customers to develop many of today's most widely used thin film techniques.
- Cathode and magnets are ISOLATED FROM WATER
- Design requires only ONE vacuum seal
- Supplied as either HV or UHV
- NO water to Vacuum seal
- Sputters MAGNETIC MATERIAL
- Target requires NO CLAMPING or BONDING to cathode
- Operates in DC or RF power modes
- Sputters from 0.5 - 600 mTorr Ar.
- Adjustable anode, PREVENTS build up and shadowing
Available MAK Sputter Guns
Currently, MeiVac is making available the following MAK sputter guns:
PRODUCT |
PART NUMBER |
| 1.3" MAK Sputter Gun | L130A01 |
| 2" MAK Sputter Gun | L200A01 |
| 3" MAK Sputter Gun | L300A01 |
| 4" MAK Sputter Gun | L400A01 |
| 6" MAK Sputter Gun | L600A01 |
| Flexmount Sputter Gun | Consult MeiVac |
| Insitu Sputter Gun | Insitu Source |
| Multi-source Flange | Multi-source Flange |
| Custom Design | Consult MeiVac |
| MAK Accessories | MAK Accessories |
Need Something Special?
In addition to standard products and accessories, MeiVac engineers can work with you to develop a custom assembly. Please call or e-mail so we can schedule a discussion about your specific needs.
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