MAK Planar Magnetron Sputter Deposition Sources

MeiVac is a leading manufacturer of planar magnetron sputter cathodes. Noted for its simplicity, ease of use, and resulting high reliability, the MAK sputter source has been designed to present the smallest profile possible and deliver higher deposition rates than any comparable sputter sources. MeiVac thin film sputter deposition products are the right choice for your process with a full range of standard and custom configurations.

MAK Sputter Deposition Sources
1.3 MAK Sputter Source - Vertical L130A01 330x248

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  • 1.3″ diameter sputter targets
  • Vertical, horizontal, flexmaount, and flange mount configurations
  • Operates RF or DC
  • Sputters magnetic and non-magnetic materials
  • HV and UHV configurations
  • Water cooled
2.0 MAK Sputter Source - Vertical L200A01 400x300

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  • 2.0″ diameter sputter targets
  • Vertical, horizontal, flexmaount, and flange mount configurations
  • Operates RF or DC
  • Sputters magnetic and non-magnetic materials
  • HV and UHV configurations
  • Water cooled
3.0 MAK Sputter Source - Vertical L300A01 400x300

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  • 3.0″ diameter sputter targets
  • Vertical, horizontal, flexmaount, and flange mount configurations
  • Operates RF or DC
  • Sputters magnetic and non-magnetic materials
  • HV and UHV configurations
  • Water cooled
4.0 MAK Sputter Source - Vertical L400A01

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  • 4.0″ diameter sputter targets
  • Vertical, horizontal, flexmaount, and flange mount configurations
  • Operates RF or DC
  • Sputters magnetic and non-magnetic materials
  • HV and UHV configurations
  • Water cooled
4.0 MAK Sputter Source - Vertical L400A01

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  • 6.0″ diameter sputter targets
  • Vertical, horizontal, flexmaount, and flange mount configurations
  • Operates RF or DC
  • Sputters magnetic and non-magnetic materials
  • HV and UHV configurations
  • Water cooled

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