Insitu-Motion MAK Sputter Source

Insitu Angular Motion

Provides insitu adjustment of angle from 0-45° without breaking vacuum.

  • Adaptable to 1.3″ through 4″ MAK
  • 0-45° Angular Adjustment
  • Bakeable to 120&176;C
  • UHV Compatible

Insitu Linear Motion

Provides target to substrate distance change without breaking vacuum.

  • Adaptable to 1.3″ through 4″ MAK
  • 1-6″ Linear Travel
  • Welded Bellows
  • Bakeable to 120&176;C
  • UHV Compatible

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