HTR Substrate Heater Family

MeiVac substrate heaters were designed to operate under rigorous conditions and they are both UHV and O2 compatible. Known for their unprecedented temperature uniformity, the HTR heaters have been used for some very demanding applications. They have been used in sputtering, laser ablation, ion beam deposition, ECR, MOCVD among others. In 2012 MeiVac developed the VTAC – Variable Temperature AC controller to provide a closed loop control package for the HTR heater stages.

HTR – 950C Substrate Heaters
SU-200-HH substrate heater

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  • 2.0″ diameter heated stage for samples
  • UHV Compatible
  • O2 Compatible
  • Variable size and geometries of samples
  • RF/DC biasing
  • Maximum temperature 950C
heater_2_inch - SU-200-IH

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  • 2.0″ diameter heated stage for wafers
  • UHV Compatible
  • O2 Compatible
  • Variable size and geometries of samples
  • RF/DC biasing
  • Maximum temperature 950C
SU-300-HH substrate heater

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  • 3.0″ diameter heated stage for samples
  • UHV Compatible
  • O2 Compatible
  • Variable size and geometries of samples
  • RF/DC biasing
  • Maximum temperature 950C
HTR Substrate Heater - 4 inch

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  • 4.0″ diameter heated stage for wafers
  • UHV Compatible
  • O2 Compatible
  • Variable size and geometries of samples
  • RF/DC biasing
  • Maximum temperature 950C
HTR Substrate Heater - 6 inch wafer

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  • 6.0″ diameter heated stage for wafers
  • UHV Compatible
  • O2 Compatible
  • Variable size and geometries of samples
  • RF/DC biasing
  • Maximum temperature 950C

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